Quantum Superinductor with Tunable Non-Linearity: Supplementary Materials
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چکیده
The superinductor, the lumped-element LC resonator, and the microstrip feedline line were fabricated within the same vacuum cycle using multi-angle electron-beam deposition of Al films through a nanoscale lift-off mask. To minimize the spread of the junction parameters, we have used the so-called“Manhattan-pattern”bi-layer liftoff mask formed by a 400-nm-thick e-beam resist (the top layer) and 50-nm-thick copolymer (the bottom layer). In this technique, the circuit is formed by aluminum strips of a well-controlled width intersecting at right angles (thus, the “streets” and “avenues”). After depositing the photoresist on an undoped Si substrate and exposing the pattern with e-beam lithography, the sample was placed in an ozone asher to remove any traces of the photoresist residue. This step is crucial for reducing the spread in junction parameters.
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تاریخ انتشار 2012